A new atmospheric pressure plasma deposition process for carbon and titanium thin films fabrication

Materials Forum

Volumn 29, Issue , 2005, Pages 71-76

  Paulmier, T ^a   Izake, E L ^a   Runge, C ^a   Bell, J ^a   Fredericks, P ^a  

^a QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CARBON; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; ION IMPLANTATION; IONIZATION; MELTING; NANOSTRUCTURED MATERIALS; PARAMETER ESTIMATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM;

ATMOSPHERIC PRESSURE PLASMA DEPOSITION (APPD); DEPROTONATION; LIQUID PRECURSORS; PHYSICO-CHEMICAL MECHANISMS;

PLASMA THEORY;

EID: 24044502297     PISSN: 08832900     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

References (5)

1. A. L. Yerokhin, X. Nie, A. Leyland, A. Matthews and S. J. Dowey, Surface and Coatings Technology, 1999, 122, pp 73-93
2. X. Nie, A. Leyland, H. W. Song, A. L. Yerokhin, S. J. Dowey and A. Matthews, Surface and Coatings Technology, 1999, 116-119, pp 1055-1060
3. J. Robertson, J. Mater. Sci. R, 2002, 37, pp 129-281
4. S. Ngamsinlapasathian, S. Sakulkhaemaruethai, S. Pavasupree, A. Kitiyanan, T. Sreethawong, Y. Suzuki and S. Yoshikawa, J. of Photochemistry and Photobiology A: Chemistry, 2004, vol. 164 (1-3), pp 145-151
5. O. K. Varghese, D. Gong, M. Paulose, K. G. Ong and C. A. Grimes, Sensors and Actuators B: Chemical, 2003, vol. 93 (1-3), pp 338-344