Characterization of two-photon absorption related to the enhanced bulk damage resistance in CsLiB6O10 crystal

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 20-23, 2005, Pages

  Kamimura, Tomosumi ^a   Nakamura, Ryosuke ^b   Horibe, Hideo ^c   Nishioka, Munenori ^b   Yamamoto, Masashi ^c   Yoshimura, Masashi ^b   Mori, Yusuke ^b   Sasaki, Takatomo ^b   Yoshida, Kunio ^a  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c KOCHI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

266 nm; Bulk damage resistance; CsLiB6O10(CLBO); Laser damage resistance; Two photon absorption

Indexed keywords

ABSORPTION; CRYSTALS; ELECTRIC RESISTANCE; PHOTONS; THRESHOLD ELEMENTS;

266 NM; BULK DAMAGE RESISTANCE; CSLIB6O10 (CLBO); LASER DAMAGE RESISTANCE; TWO-PHOTON ABSORPTION;

LASER PULSES;

EID: 23944465881     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L665     Document Type: Article

References (8)

1. Y. Mori, I. Kuroda, S. Nakajima, T. Sasaki and S. Nakai: Appl. Phys. Lett. 67 (1995) 1818.
2. Y. K. Yap, M. Inagaki, S. Nakajima, Y. Mori and T. Sasaki: Opt. Lett. 21 (1996) 1348.
3. M. Yoshimura, T. Kamimura, K. Murase, Y. Mori, H. Yoshida, M. Nakatsuka and T. Sasaki: Jpn. J. Appl. Phys. 38 (1999) 129.
4. T. Kojima, S. Konno, S. Fujikawa, K. Yasui, T. Kamimura, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka and Y. Okada: Tech. Dig. CLEO'2001, 2001, p. 390.
5. T. Ohtsuki, H. Kitano, H. Kawai and S. Owa: Tech. Dig. CLEO'2000, 2000, CPD9.
6. K. Nakai, T. Kamimura, H. Sawada, M. Yoshimura, Y. Mori, T. Sasaki, H. Yoshida and M. Nakatsuka: CLEO/Pacific Rim'99, 1999, p. 967.
7. T. Kamimura, R. Ono, Y. K. Yap, M. Yoshimura, Y. Mori and T. Sasaki: Jpn. J. Appl. Phys. 40 (2001) L111.
8. P. Liu, W. L. Smith, H. Lotem, J. H. Bechtel and N. Bloembergen: Phys. Rev. B 17 (1978) 4620.