Plasma jet emission in fast-pulsed capillary discharges

Journal of Applied Physics

Volumn 98, Issue 2, 2005, Pages

  Caballero, L S ^a,b   Chuaqui, H ^a   Favre, M ^a   Mitchell, I ^a   Wyndham, E ^a  

^a PONTIFICIA UNIVERSIDAD CATÓLICA DE CHILE   (Chile)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

PRESSURE GRADIENTS; PULSED CAPILLARY DISCHARGE (PCD); RADIATION SOURCES; VACUUM ULTRAVIOLET (VUV);

CAMERAS; CARRIER CONCENTRATION; CHARGE COUPLED DEVICES; ELECTRIC POTENTIAL; ELECTRON BEAMS; INDUCTANCE; INTERFEROMETRY; LASER PULSES; NEODYMIUM COMPOUNDS; PARTICULATE EMISSIONS; PLASMA DENSITY; PLASMA JETS; ULTRAVIOLET RADIATION;

ELECTRIC DISCHARGES;

EID: 23844548640     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1984077     Document Type: Article

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