Topography changes of rhodium electrodes induced by the application of fast periodic potential routines

Journal of Solid State Electrochemistry

Volumn 7, Issue 4, 2003, Pages 208-216

  Méndez, Eduardo ^b   Castro Luna, Ana M ^a   Cerdá, María F ^b   Mombrú, Alvaro W ^b   Zinola, Carlos F ^b   Martins, María E ^a  

^a INSTITUTO DE INVESTIGACIONES FISICOQUÍMICAS TEÓRICAS Y APLICADAS INIFTA   (Argentina)

^b UNIVERSIDAD DE LA REPÚBLICA   (Uruguay)

Author keywords

Chemical etching; Electrochemical faceting; Rhodium

Indexed keywords

COPPER; CYCLIC VOLTAMMETRY; ETCHING; RHODIUM; SCANNING ELECTRON MICROSCOPY; SULFURIC ACID; SURFACE STRUCTURE; X RAY DIFFRACTION;

CHEMICAL ETCHING; ELECTROCHEMICAL FACETING;

ELECTRODES;

EID: 23844514215     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-002-0299-y     Document Type: Article

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