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Materials Chemistry and Physics

Volumn 94, Issue 1, 2005, Pages 141-147

Microstructure and electrical properties of Ba1 - XSr xTiO3 thin films prepared by rf magnetron sputtering

(4) Chiu, M C a Wang, C C a Yao, H C a Shieu, F S a

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

BST; Dielectric constant; Microstructure; rf magnetron sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; BARIUM COMPOUNDS; CRYSTALLINE MATERIALS; CURRENT DENSITY; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; MICROSTRUCTURE; PERMITTIVITY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

BST; COLUMNAR STRUCTURE; RF MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 23844513781 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2005.04.022 Document Type: Article

Times cited : (11)

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