High critical current density YBa 2Cu 3O 7-δ thin film growth by post-deposition processing at low pressures

Materials Research Society Symposium Proceedings

Volumn EXS, Issue 3, 2004, Pages 93-95

  Zhang, Yifei ^a,b   Feenstra, Ron ^a   Thompson, James R ^a,c   Gapud, Albert A ^a   Aytug, Tolga ^a,c   Christen, David K ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b University of Tennessee Knoxville   (United States)

^c UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUX PINNING; METAL-ORGANIC DEPOSITION (MOD); OXYGEN PRESSURE; PRECURSOR FILMS;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); PHYSICAL VAPOR DEPOSITION; REACTION KINETICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUPERCONDUCTING MATERIALS; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

YTTERBIUM COMPOUNDS;

EID: 23844489545     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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