Low pressure magnetron sputtering by using extremely strong magnetic field and coverage properties of copper films grown as advanced seed layer

Advanced Metallization Conference (AMC)

Volumn , Issue , 2003, Pages 681-686

  Hazama, H ^a   Imai, A ^a   Matsuda, T ^b   Mizutani, U ^c   Ikuta, H ^c   Yanagi, Y ^d   Itoh, Y ^d   Sakurai, K ^e   Sekiguchi, A ^e   Yamazaki, T ^f  

^a NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE   (Japan)

^b DIAX Co Ltd   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d Aisin Cosmos R and D Co   (Japan)

^e ANELVA Corp ^*  (Japan)

^f UNIVERSITY OF TOYAMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MAGNETIC FIELDS; PHYSICAL VAPOR DEPOSITION; SPUTTERING; SUPERCONDUCTING MAGNETS;

BULK MAGNETS; DEPOSITION RATE; DISCHARGE CURRENTS; GAS PRESSURE;

MAGNETRON SPUTTERING;

EID: 23844464514     PISSN: 15401766     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. U. Mizutani, T. Matsuda, Y. Yanagi, Y. Itoh, H. Ikuta, T.Oka: in Processings of High-Temperature Superconducting Ceramic Transactions 140, 273 (2003).
2. T. Matsuda, S. Kashimoto, A. Imai, Y. Yanagi, Y. Itoh, H. Ikuta, U. Mizutani, K. Sakurai and H. Hazama: Physica C (2003) (in press).
3. U. Mizutani, H. Hazama, T. Matsuda, Y. Yanagi, Y. Itoh, H. Ikuta, K. Sakurai and A. Imai: Supercond.Sci.Technol. 16, 1 (2003).
4. th Inter. Workshop on Processing and Applications of Superconducting (RE)BCO Large Grain Materials, (June 30-July 2, 2003, Jena, Germany)
5. H. Ikuta, A. Mase, Y. Yanagi, M. Yoshikawa, Y. Itoh, T. Oka, U. Mizutani: Supercond. Sci. Technol. 11, 1345 (1998).
6. U. Mizutani, A. Mase, H. Ikuta, Y. Yanagi, M. Yoshikawa, Y. Itoh, T. Oka: Mat. Sci. Eng. B 65, 66 (1999).