Effect of implanted Cl and deposited oxides on the pitting behavior of aluminum

Journal of the Electrochemical Society

Volumn 152, Issue 7, 2005, Pages

  Serna, L M ^a   Johnson, C M ^a   Wall, F D ^a   Barbour, J C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHLORINE; DEPOSITION; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL ELECTRODES; INTERFACES (MATERIALS); ION IMPLANTATION; NUCLEATION; POLARIZATION;

ALUMINUM OXIDES; METASTABLE PITTING; PITTING BEHAVIOR; PITTING CORROSION;

PITTING;

EID: 23744501490     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1924308     Document Type: Article

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