Low-resistivity sputtered films of transparent conducting Ta-doped in 2O 3 oxide

Journal of the Korean Physical Society

Volumn 47, Issue 1, 2005, Pages 148-151

  Moon, Joonchul ^a   Shin, Yungsu ^a   Kang, Kwangsun ^a   Park, Seung Han ^a   Ju, Honglyoul ^a   Jeong, Chang Oh ^b   Park, Changwoo ^c  

^a Yonsei University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Hanbat National University   (South Korea)

Author keywords

Magnetron sputtering; Ta doped In 2O 3; Transparent conducting oxides

Indexed keywords

EID: 23744438447     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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