Calibrating method of magnetron sputtering materials deposition rate

Guangxue Jishu/Optical Technique

Volumn 31, Issue 4, 2005, Pages 537-539

  Wu, Wen Juan ^a   Wang, Zhan Shan ^a   Zhang, Zhong ^a   Wang, Hong Chang ^a   Wang, Feng Li ^a   Qin, Shu Ji ^a   Chen, Ling Yan ^a  

^a TONGJI UNIVERSITY   (China)

Author keywords

Calibrating the deposition rate; Magnetron sputtering; Multilayer

Indexed keywords

EID: 23644459998     PISSN: 10021582     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)