Challenges in excimer laser lithography for 256M DRAM and beyond

Technical Digest - International Electron Devices Meeting, IEDM

Volumn 1992-December, Issue , 1992, Pages 45-48

  Endo, M ^a   Hashimoto, K ^a   Yamashita, K ^a   Katsuyama, A ^a   Matsuo, T ^a   Tani, Y ^a   Sasago, M ^a   Nomura, N ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DEVICES; EXCIMER LASERS; LITHOGRAPHY;

ARF EXCIMER LASER; CHEMICALLY AMPLIFIED; CHEMICALLY AMPLIFIED POSITIVE RESISTS; KRF EXCIMER LASER; LASER LITHOGRAPHY; OFF AXIS ILLUMINATION; PATTERN FABRICATION; POSITIVE RESISTS;

FLUORINE COMPOUNDS;

EID: 23544441415     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.1992.307305     Document Type: Conference Paper

References (7)

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2. K. Kamon, T. Miyamoto, H. Nagata and M. Tanaka, "Photolithography system using annular illumination, " Digest of Papers 1991 4th MicroProcess Conference, p. 70, 1991.
3. H. Fukuda and R. Yamanaka, "A new pupil filter for annular illumination in optical lithography, " Digest of Papers 1992 5th MicroProcess Conference, p. 48, 1992.
4. M. Endo, Y. Tani, T. Koizumi, S. Kobayashi, K. Yamashita, M. Sasago and N. Nomura, "Quarter micron KrF excimer laser lithography, " 1992 Symposium on VLSI technology Digest of Technical Papers, p. 110, 1992.
5. T. Sato, T. Ono, T. Miyata, M. Yamamoto, S. Aoki, H. Nagano, S. Kaino, S. Kimura, S. Mizoguchi, Y. Yamamoto, M. Sasago, N. Nomura and Y. Shimada, "KrF excimer laser lithography system for sub-half micron devices, " Digest of Papers 1991 4th MicroProcess Conference, p. 72, 1991.
6. Y. Hirai, S. Tomida, K. Ikeda, M. Sasago, M. Endo, S. Hayama and N. Nomura, "Three-dimensional resist process simulator PEACE (Photo and Electron Beam Lithography Analyzing Computer Engineering System), " IEEE Trans, on Computer-aided Design of Integrated Circuits and Systems, vol. 10, pp. 802-807, June 1991.
7. N. Nomura, H. Nakagawa, Y. Tani, K. Koga, N. Araki, T. Sato and M. Sasago, "ArF quarter-micron projection lithography with an aspherical lens system, " Microelectronic Engineering, vol. 11, pp. 183-186, 1990.