LiF thin layers on Si(1 0 0) studied by ESD, LEED, AES, and AFM

Surface Science

Volumn 541, Issue 1-3, 2003, Pages 173-181

  Golek F ^a   Mazur, P ^a  

^a UNIVERSITY OF WROC AW   (Poland)

Author keywords

Alkali halides; Atomic force microscopy; Auger electron spectroscopy; Electron stimulated desorption (ESD); Growth; Low energy electron diffraction (LEED); Silicon; Single crystal surfaces; Surface structure, morphology, roughness, and topography

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DESORPTION; IONS; KINETIC ENERGY; LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; SINGLE CRYSTALS; SURFACES;

ELECTRON STIMULATED DESORPTION (ESD);

SURFACE STRUCTURE;

EID: 2342666967     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00913-0     Document Type: Article

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