Photooxidation of a mustard gas simulant over TiO 2-SiO 2 mixed-oxide photocatalyst: Site poisoning by oxidation products and reactivation

Langmuir

Volumn 20, Issue 9, 2004, Pages 3674-3678

  Panayotov, D ^a   Kondratyuk, P ^a   Yates Jr , J T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MINERALIZATION; PHOTOCATALYTIC OXIDATION; SITE POISONING; ULTRA-VIOLET (UV) ILLUMINATION;

ADSORPTION; CATALYST POISONING; HYDROGEN BONDS; INFRARED SPECTROSCOPY; PHOTOCATALYSIS; PHOTOOXIDATION; PORE SIZE; PRESSURE EFFECTS; THERMAL EFFECTS; ULTRAHIGH VACUUM; ULTRAVIOLET RADIATION;

CATALYSTS;

ADSORPTION; CATALYSTS; OXIDATION; ULTRAVIOLET RADIATION; VACUUM;

MUSTARD GAS; SILICON DIOXIDE; TIO2 SIO2; TIO2-SIO2; TITANIUM;

ARTICLE; CATALYSIS; CHEMISTRY; OXIDATION REDUCTION REACTION; PHOTOCHEMISTRY; SPECTROSCOPY; TEMPERATURE;

CATALYSIS; MUSTARD GAS; OXIDATION-REDUCTION; PHOTOCHEMISTRY; SILICON DIOXIDE; SPECTRUM ANALYSIS; TEMPERATURE; TITANIUM;

EID: 2342598404     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0303815     Document Type: Article

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