Effect of O2 on NO removal by ammonia radical injection using one-cycle sinusoidal power source

Thin Solid Films

Volumn 457, Issue 1, 2004, Pages 39-43

  Yamamoto, Kiwamu ^a   Yukimura, Ken ^a   Kambara, Shinji ^b   Moritomi, Hiroshi ^b   Yamashita, Toru ^c   Maruyama, Toshiro ^d  

^a DOSHISHA UNIVERSITY   (Japan)

^b GIFU UNIVERSITY   (Japan)

^c IDEMITSU KOSAN CO LTD   (Japan)

^d KYOTO UNIVERSITY   (Japan)

Author keywords

Dielectric barrier discharge; Nitric oxide; Radical injection

Indexed keywords

ARGON; DECOMPOSITION; ELECTRIC POTENTIAL; ELECTRODES; ENERGY EFFICIENCY; EXHAUST GASES; GROUND STATE; NITROGEN REMOVAL; OXYGEN;

DIELECTRIC BARRIER DISCHARGE; NITRIC OXIDES; PLASMA REACTORS; RADICAL INJECTION;

NITROGEN OXIDES;

EID: 2342584744     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.011     Document Type: Conference Paper

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