Principles and Applications of Laser-Induced Liquid-Phase Jet-Chemical Etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5063, Issue , 2003, Pages 227-232

  Stephen, Andreas ^a   Metev, Simeon ^a   Vollertsen, Frank ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

Author keywords

Chemical jet; Laser processing; Thermochemical etching

Indexed keywords

CHEMICAL ACTIVATION; COMPOSITE MICROMECHANICS; CORRELATION METHODS; ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; ETCHING; LASER BEAM EFFECTS; METAL FOIL; OPTICAL RESOLVING POWER; PHOSPHORIC ACID; RADIATION EFFECTS; THIN FILMS;

CHEMICAL JET; LASER PROCESSING; LIQUID JET-STREAM; METAL SURFACE; THERMOCHEMICAL ETCHING;

LASER APPLICATIONS;

EID: 2342572355     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.540525     Document Type: Conference Paper

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