ZT thin films produced by metal organic-chemical vapour deposition to be used as high-k dielectrics

Materials Science and Engineering: B

Volumn 109, Issue 1-3, 2004, Pages 104-112

  Padeletti, G ^a   Cusma A ^a   Viticoli, M ^a   Ingo, G M ^a   Mezzi, A ^a   Watts, B ^a  

^a CNR   (Italy)

Author keywords

High k; MO CVD; Thin films; Zirconium titanate

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

PLATINUM COATED SUBSTRATES; ZIRCONIUM TITANATE;

THIN FILMS;

EID: 2342559183     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.10.058     Document Type: Conference Paper

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