High-Temperature Kinetics of the Homogeneous Reverse Water-Gas Shift Reaction

AIChE Journal

Volumn 50, Issue 5, 2004, Pages 1028-1041

  Bustamante, F ^a   Enick, R M ^a   Cugini, A V ^b   Killmeyer, R P ^b   Howard, B H ^b   Rothenberger, K S ^b   Ciocco, M V ^c   Morreale, B D ^c   Chattopadhyay, S ^a   Shi, S ^d  

^a University of Pittsburgh   (United States)

^b NATIONAL ENERGY TECHNOLOGY LABORATORY   (United States)

^c PARSONS CORPORATION   (United States)

^d ANSYS INC   (United States)

Author keywords

High temperature; Homogeneous; Inconel; Kinetics; Water gas shift

Indexed keywords

CATALYSIS; CHEMICAL REACTORS; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; HIGH TEMPERATURE EFFECTS;

BRADFORD MECHANISM; COMPUTATIONAL FLUID DYNAMICS SIMULATION; HIGH-TEMPERATURE KINETICS;

REACTION KINETICS;

NICKEL; SILICON DIOXIDE; WATER;

KINETICS;

ARTICLE; CATALYSIS; CHEMICAL REACTION; CHEMICAL REACTION KINETICS; DYNAMICS; FLUID FLOW; GAS; GEOMETRY; HIGH TEMPERATURE; MODEL; PACKED BED REACTOR; PHASE TRANSITION; PRESSURE; REACTION TIME; SURFACE PROPERTY;

ARRHENIUS;

EID: 2342535238     PISSN: 00011541     EISSN: None     Source Type: Journal    
DOI: 10.1002/aic.10099     Document Type: Article

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