Optical characterization of fullerene films on flat and patterned semiconductor substrates

Carbon

Volumn 42, Issue 5-6, 2004, Pages 1089-1093

  Dmitruk, I M ^a   Dmitruk, N L ^b   Basiuk, E V ^c   Banuelos J G ^c   Esparza, Alejandro ^c   Saniger, José M ^c  

^a TARAS SHEVCHENKO NATIONAL UNIVERSITY OF KYIV   (Ukraine)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

^c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

A. Fullerene film; C. Ellipsometry, C. Raman spectroscopy; D. Photoluminescence, D. Surface structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIMERS; ELLIPSOMETRY; ETCHING; PHOTOLUMINESCENCE; POLYMERIZATION; RAMAN SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SUPERFLUID HELIUM; SURFACE STRUCTURE; TUNGSTEN;

ARGON LASER EXCITATION; LATTICE MISMATCH; OPTICAL CHARACTERIZATION; VACUUM SUBLIMATION TECHNIQUE;

FULLERENES;

EID: 2342522771     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2003.12.009     Document Type: Conference Paper

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