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Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 95, Issue 4, 2004, Pages 252-257

Interfacial reaction mechanisms and the structure of moving heterophase boundaries during pyrochlore- and spinel-forming solid state reactions

(2) Hesse, Dietrich a Senz, Stephan a

a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

Author keywords

Electron microscopy; Pyrochlores; Reactive interfaces; Solid state reactions; Spinels

Indexed keywords

DEPOSITION; EVAPORATION; HIGH TEMPERATURE EFFECTS; INTERFACES (MATERIALS); OXIDES; PHASE COMPOSITION; REACTION KINETICS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PYROCHLORES; REACTIVE INTERFACES; SOLID-STATE REACTIONS; SPINELS;

CERAMIC MATERIALS;

EID: 2342491872 PISSN: 00443093 EISSN: None Source Type: Journal
DOI: 10.3139/146.017945 Document Type: Conference Paper

Times cited : (6)

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