EELS and AES investigation of Rh thin film growth on polycrystalline Al substrate

Vacuum

Volumn 74, Issue 2, 2004, Pages 141-145

  Thiam, M M ^a,c   Hrncir T ^b   Matolin V ^b   Nehasil, V ^b  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b CHARLES UNIVERSITY   (Czech Republic)

^c J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

Author keywords

Alloy; Aluminium; Auger electron spectroscopy (AES); Electron energy loss spectroscopy (EELS); Growth; Plasmon; Rhodium

Indexed keywords

ADSORPTION; ALUMINUM; AUGER ELECTRON SPECTROSCOPY; CATALYSTS; DESORPTION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC STRUCTURE; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS;

ELECTRONIC ENVIRONMENT; INNER SHELL TRANSITIONS; PLASMON;

FILM GROWTH;

EID: 2342489476     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.12.111     Document Type: Conference Paper

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