Organosilicon dental composite restoratives based on 1,3-bis[(p- acryloxymethyl) phenethyl] tetramethyldisiloxane

Dental Materials

Volumn 20, Issue 6, 2004, Pages 570-578

  Lai, J H ^a   Johnson, A E ^a   Douglas, R B ^b  

^a LAI Laboratories Inc   (United States)

^b ADC   (United States)

Author keywords

Degree of conversion; Dental composites; Shrinkage; Siloxane monomer

Indexed keywords

HARDNESS; MOLECULAR WEIGHT; MONOMERS; POLYMERIZATION; REFRACTIVE INDEX; SHRINKAGE; SILICONES; SORPTION; TENSILE STRENGTH; THERMODYNAMIC STABILITY; WEAR RESISTANCE;

ATTENUATED TOTAL REFLECTANCE (ATR) SPECTROSCOPY; DEGREE OF CONVERSION (DC); DIAMETRAL TENSILE STRENGTH (DTS); WATER SORPTION (WS);

DENTAL COMPOSITES;

1,3 BIS((P ACRYLOXYMETHYL)PHENETHYL)TETRAMETHYLDISILOXANE; 1,3-BIS((P-ACRYLOXYMETHYL)PHENETHYL)TETRAMETHYLDISILOXANE; BISPHENOL A BIS(2 HYDROXYPROPYL) ETHER DIMETHACRYLATE; SILOXANE; WATER;

ABSORPTION; ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; COMPARATIVE STUDY; DENTAL CARE; DENTAL SURGERY; ENDODONTICS; HARDNESS; LIGHT; MATERIALS TESTING; METHODOLOGY; PHASE TRANSITION; RADIATION EXPOSURE; TENSILE STRENGTH;

ABSORPTION; BISPHENOL A-GLYCIDYL METHACRYLATE; DENTAL RESTORATION, PERMANENT; DENTAL STRESS ANALYSIS; HARDNESS; LIGHT; MARGINAL ADAPTATION (DENTISTRY); MATERIALS TESTING; MOLECULAR STRUCTURE; PHASE TRANSITION; SILOXANES; TENSILE STRENGTH; WATER;

EID: 2342483658     PISSN: 01095641     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.dental.2003.10.002     Document Type: Article

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