Crystallographic properties of four-fold grain K3Li 2Nb5O15 thin films

Thin Solid Films

Volumn 457, Issue 2, 2004, Pages 397-401

  Park, Sung Kun ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Deposition process; Growth mechanism; SEM; Sputtering; X ray diffraction

Indexed keywords

CRYSTALLOGRAPHY; DEPOSITION; FERROELECTRIC MATERIALS; FIELD EMISSION CATHODES; GALLIUM NITRIDE; LITHIUM; NIOBIUM; PIEZOELECTRIC DEVICES; POTASSIUM COMPOUNDS; PYROELECTRICITY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; X RAY DIFFRACTION;

FOUR-FOLD GRAINS; FUSED QUARTZ; GROWTH MECHANISM; KLN FILM;

THIN FILMS;

EID: 2342468045     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.069     Document Type: Article

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