Negative effects of reactive sputtering in an industrial plasma nitriding

Journal of Materials Engineering and Performance

Volumn 14, Issue 3, 2005, Pages 343-350

  Rolinski E ^a   Arner, J ^b   Sharp, G ^a  

^a Advanced Heat Treat Corp   (United States)

^b Struers Inc ^*  (United States)

Author keywords

Deposit from plasma; Nitrided layer uniformity; Plasma nitriding; Sputtering

Indexed keywords

DEPOSIT FROM PLASMA; NITRIDED LAYER UNIFORMITY; PLASMA NITRIDING; VAPOR-DEPOSITED PHASE;

COMPUTATIONAL GEOMETRY; INDUSTRIAL APPLICATIONS; NITRIDING; PLASMA APPLICATIONS; PRESSURE EFFECTS; REACTION KINETICS; SPUTTERING;

STAINLESS STEEL;

EID: 23344438365     PISSN: 10599495     EISSN: None     Source Type: Journal    
DOI: 10.1361/10599490523986     Document Type: Article

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