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Volumn 14, Issue 2, 2005, Pages
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Our featured division: Dielectric science & technology
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Author keywords
[No Author keywords available]
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Indexed keywords
EQUIVALENT OXIDE THICKNES (EOT);
GATE DIELECTRIC;
INTERLEVEL METAL ISOLATION;
OXIDE THICKNESS;
CURRENT DENSITY;
DIELECTRIC MATERIALS;
INFORMATION TECHNOLOGY;
SEMICONDUCTING SILICON;
SILICA;
SWITCHING;
THIN FILMS;
CMOS INTEGRATED CIRCUITS;
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EID: 23244467304
PISSN: 10648208
EISSN: None
Source Type: Journal
DOI: None Document Type: Review |
Times cited : (1)
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References (0)
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