Structural and photocatalytic properties of TiO2 films fabricated on silicon substrates by MOCVD method

Journal of Environmental Sciences

Volumn 17, Issue 1, 2005, Pages 146-151

  Yang, Jia Long ^a   Li, Ying ^a   Wang, Fu ^a   Zuo, Liang ^a   Yi, Gu Chul ^b   Choi, Wong Yong ^b  

^a NORTHEASTERN UNIVERSITY   (China)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

MOCVD; Photocatalystic degradation; Silicon(100); Silicon(111)

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOCATALYSIS; PHOTODEGRADATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; X RAY DIFFRACTION;

PHOTOCATALYTIC DEGRADATION; PHOTOCATALYTIC PROPERTIES; PHOTODEGRADATION EFFICIENCY;

TITANIUM DIOXIDE;

CATALYST; SILICON; TITANIUM OXIDE;

2 NAPHTHOL ORANGE; 2-NAPHTHOL ORANGE; AZO COMPOUND; BENZENESULFONIC ACID DERIVATIVE; SILICON; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; CATALYSIS; CHEMISTRY; COMPARATIVE STUDY; METHODOLOGY; PHOTOCHEMISTRY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; ULTRAVIOLET SPECTROPHOTOMETRY; WATER MANAGEMENT; X RAY DIFFRACTION;

AZO COMPOUNDS; BENZENESULFONATES; CATALYSIS; MICROSCOPY, ELECTRON, SCANNING; PHOTOCHEMISTRY; SILICON; SPECTROPHOTOMETRY, ULTRAVIOLET; TEMPERATURE; TITANIUM; WATER PURIFICATION; X-RAY DIFFRACTION;

EID: 23244444655     PISSN: 10010742     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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