High-deposition-rate dielectric thin film for phase change optical disc

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 5 B, 2005, Pages 3634-3637

  Kariyada, Eiji ^a   Ohkubo, Shuichi ^a   Tanabe, Hideki ^a   Ide, Tatsunori ^a  

^a NEC CORPORATION   (Japan)

Author keywords

High deposition rate; Low to high media; Phase change recording; SiNiON film

Indexed keywords

APPROXIMATION THEORY; DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; OPTICAL DEVICES; OPTICAL RECORDING; PRODUCTIVITY; REFRACTIVE INDEX; SILICON COMPOUNDS; SPUTTER DEPOSITION; VIDEODISKS;

HIGH-DEPOSITION RATES; LOW-TO-HIGH MEDIA; PHASE CHANGE RECORDING; SINION FILMS;

THIN FILMS;

EID: 23144462346     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.3634     Document Type: Conference Paper

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