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Thin Solid Films

Volumn 489, Issue 1-2, 2005, Pages 291-295

Computations of local electric field and electric forces acting on carbon nanotubes in a direct current plasma sheath

(5) Blaek, J a,b Spatenka P a,c Pacal F a Taschner Ch a Leonhardt, A a

a IFW DRESDEN (Germany)

b UNIVERSITY OF SOUTH BOHEMIA (Czech Republic)

c TECHNICAL UNIVERSITY OF LIBEREC (Czech Republic)

Author keywords

Carbon nanotubes; Electrical properties and measurements; Plasma processing and deposition

Indexed keywords

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ELECTRIC PROPERTIES; ELECTROSTATICS; MATHEMATICAL MODELS; NANOTECHNOLOGY; NUMERICAL ANALYSIS; PLASMA SHEATHS;

ELECTRIC FORCES; ELECTRICAL PROPERTIES AND MEASUREMENTS; MECHANICAL REINFORCEMENT; PLASMA PROCESSING AND DEPOSITION;

ELECTRIC FIELDS;

EID: 23144457568 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.04.084 Document Type: Article

Times cited : (10)

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