Exchange biasing in NiFe/FeMn/NiFe with Si seed and capping layers

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue SUPPL. 1, 2004, Pages

  Hwang, D G ^a   Kim, S W ^b   Kim, B K ^a   Lee, J Y ^a   Kim, J K ^c   Rhee, J R ^d   Lee, S S ^a  

^a Sangji University   (South Korea)

^b Dankook University   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

^d Sookmyung Women's University   (South Korea)

Author keywords

Annealing; Crystal texture; Exchange biasing field; Si seed; Silicide

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ELECTRIC POTENTIAL; ION BEAM ASSISTED DEPOSITION; MAGNETIC ANISOTROPY; MAGNETOMETERS; NICKEL COMPOUNDS; SILICON; TEXTURES; X RAY DIFFRACTION ANALYSIS;

CAPPING LAYERS; CRYSTAL TEXTURE; DEPOSITION RATES; EXCHANGE BIASING FIELDS; SI SEED; SILICIDE; TEMPERATURE DEPENDENCE;

MULTILAYERS;

EID: 23144449907     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.723     Document Type: Conference Paper

References (4)

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3. D.R. Loraine, et al., J. Appl. Phys. 87 (2000) 5161.
4. B.K. Kim, et al., J. Kor. Mag. Soc. 12 (2002) 132.