Fabrication of cobalt particles by ion beam-induced chemical vapor deposition (IBICVD)

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue SUPPL. 1, 2004, Pages

  Kageyama, Y ^a   Lapicki, Adam ^b   Suzuki, T ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b UNIVERSITY OF NOTRE DAME   (United States)

Author keywords

Carbonyl; Cobalt; Deposition; IBICVD; Pattern formation

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ENTHALPY; REACTION KINETICS; VECTORS;

CARBONYL; ION -BEAM INDUCED CVD (IBICVD); MOMENTUM TRANSFER; PATTERN FORMATION;

COBALT;

EID: 23144439965     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.202     Document Type: Conference Paper

References (4)

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4. G.P. Rosini, F. Liu, K. K-Jespersen, A.S. Goldman, C. Li, S.P. Nolan, J. Am. Chem. Soc. 120 (1998) 9256.