Study of 193 nm photoresist

Ganguang Kexue yu Guanghuaxue/Photographic Science and Photochemistry

Volumn 23, Issue 4, 2005, Pages 300-311

  Zheng, Jin Hong ^a   Huang, Zhi Qi ^a   Chen, Xin ^a   Jiao, Xiao Ming ^a   Yang, Lan ^a   Wen, Wu ^a   Gao, Zi Qi ^a   Wang, Yan Mei ^a  

^a INSTITUTE OF CHEMISTRY   (China)

Author keywords

193 nm; Formulation; Matrix resin; Monomer; Photo acid generator; Photoresist

Indexed keywords

EID: 23044496271     PISSN: 10003231     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (24)