Magnetic properties and microstructures of Fe-Pt thin films sputter deposited under partial nitrogen gas flow

Journal of Applied Physics

Volumn 98, Issue 1, 2005, Pages

  You, C Y ^a   Takahashi, Y K ^a   Hono, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ORDERING; NITROGEN GAS FLOW; SINGLE CRYSTAL SUBSTRATES; STOICHIOMETRIC COMPOSITION;

COERCIVE FORCE; MAGNETIC ANISOTROPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; SILICON WAFERS; SPUTTER DEPOSITION; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

THIN FILMS;

EID: 23044476573     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1943509     Document Type: Article

References (33)

1. O. A. Ivanov, L. V. Solina, V. A. Demshina, and L. M. Magat, Phys. Met. Metallogr. 35, 81 (1973).
2. S. W. Yung, Y. H. Chang, T. J. Lin, and M. P. Hung, J. Magn. Magn. Mater. 116, 411 (1992).
3. J. P. Liu, C. P. Luo, Y. Liu, and D. J. Sellmyer, Appl. Phys. Lett. 72, 483 (1998).
4. H. S. Ko, A. Perumal, and S.-C. Shin, Appl. Phys. Lett. 82, 2311 (2003).
5. C. P. Luo, Z. S. Shan, and D. J. Sellmyer, J. Appl. Phys. 79, 4899 (1996).
6. Y. K. Takahashi, T. Koyama, M. Ohnuma, T. Ohkubo, and K. Hono, J. Appl. Phys. 95, 2690 (2004).
7. T. Ichitsubo, K. Tanaka, M. Koujina, M. Kawashima, and M. Hirao, Jpn. J. Appl. Phys., Part 1 43, 273 (2004).
8. M. Watanabe and M. Homma, Jpn. J. Appl. Phys., Part 2 35, L1264 (1996).
9. M. H. Hong, K. Hono, and M. Watanabe, J. Appl. Phys. 84, 4403 (1998).
10. T. Goto, Y. Ide, K. Kikuchi, K. Watanabe, J. Onagawa, H. Yoshida, and J. M. Cadogan, J. Magn. Magn. Mater. 177-181, 1245 (1998).
11. T. Shima, K. Takanashi, Y. K. Takahashi, and K. Hono, Appl. Phys. Lett. 81, 1050 (2002).
12. S. Okamoto, O. Kitahkami, N. Kikuchi, T. Miyazaki, Y. Shimada, and Y. K. Takahashi, Phys. Rev. B 67, 094422 (2003).
13. Y. K. Takahashi, T. O. Seki, K. Hono, T. Shima, and K. Takanashi, J. Appl. Phys. 96, 475 (2004).
14. M. Watanabe, T. Masumoto, D. H. Ping, and K. Hono, Appl. Phys. Lett. 76, 3971 (2000).
15. D. H. Ping, M. Ohnuma, K. Hono, M. Watanabe, T. Iwasa, and T. Masumoto, J. Appl. Phys. 90, 4708 (2001).
16. H. Y. Wang, W. H. Mao, X. K. Ma, H. Y. Zhang, Y. B. Chen, Y. J. He, and E. Y. Jiang, J. Appl. Phys. 95, 2564 (2004).
17. A. Cebollada, R. F. C. Farrow, and M. F. Toney, in Magnetic Nanostructures, edited by, H. S. Nalwa, (American Scientific, Stevenson Ranch, CA, 2002), p. 95.
18. J. S. Chen, B. C. Lim, and J. P. Wang, Appl. Phys. Lett. 81, 1848 (2002).
19. V. Karanasos, I. Panagiotopoulos, D. Niarchos, H. Okumura, and G. C. Hadjipanayis, Appl. Phys. Lett. 79, 1255 (2001).
20. D. Kohler, J. Appl. Phys. 31, 408S (1960).
21. T. Seki, T. Shima, K. Takanashi, Y. Takahashi, E. Matsubara, and K. Hono, Appl. Phys. Lett. 82, 2461 (2003).
22. R. Sakurai, Y. Yamamoto, C. C. Chen, M. Hahimoto, J. Shi, Y. Nakamura, and O. Nittono, Thin Solid Films 459, 208 (2004).
23. (International Centre of Diffraction Data) Powder Diffraction, JCPDS 43-1359 (unpublished).
24. H. H. Hsiao, R. N. Panda, J. C. Shih, and T. S. Chin, J. Appl. Phys. 91, 3145 (2002).
25. H. Okamoto, in Binary Alloy Phase Diagrams, edited by, Massalski, B. Thaddeus, (Published by W. W. Scott, Jr., Ohio, 1990), p. 1752.
26. G. Herzer, IEEE Trans. Magn. 25, 3329 (1989).
27. S. Mitani, K. Takanashi, M. Sano, H. Fujimori, A. Osawa, and H. Nakajima, J. Magn. Magn. Mater. 148, 163 (1995).
28. P. Kamp, Phys. Rev. B 59, 1105 (1999).
29. S. S. A. Razee, J. B. Staunto, B. Ginatempo, E. Bruno, and F. J. Pinski, Phys. Rev. B 64, 014411 (2001).
30. Diffusion in Solid Metals and Alloys, LandoltBoernstein New Series Group III. edited by, H. Mehrer, (Springer, Berlin, 1990), Vol. 26, p. 234.
31. J. Lyubina, O. Gutfleisch, K. H. Müller, L. Schultz, and N. M. Dempsey, J. Appl. Phys. 95, 7474 (2004).
32. K. Watanabe and H. Masumoto, Trans. Jpn. Inst. Met. 24, 627 (1983).
33. Y. Tanaka, N. Kimura, K. Hono, K. Yasuda, and T. Sakurai, J. Magn. Magn. Mater. 170, 289 (1997).