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Volumn 28, Issue 8, 2005, Pages 54-61
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Process complexity fuels: Integrated metrology
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CLOSED LOOP CONTROL SYSTEMS;
COPPER;
DIELECTRIC MATERIALS;
ETCHING;
MEASUREMENTS;
SCANNING ELECTRON MICROSCOPY;
WSI CIRCUITS;
ADVANCED PROCESS CONTROL (APC);
INTEGRATED METROLOGY (IM);
REMOVAL RATE DIFFERENCES;
WAFER-TO-WAFER REPEATIBILITY;
PROCESS CONTROL;
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EID: 22944491460
PISSN: 01633767
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
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Times cited : (2)
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References (0)
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