Crystallization of silicon films by rapid joule heating method

Thin Solid Films

Volumn 487, Issue 1-2, 2005, Pages 118-121

  Andoh, Nobuyuki ^a   Sameshima, Toshiyuki ^a   Kitahara, Kuninori ^b  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b SHIMANE UNIVERSITY   (Japan)

Author keywords

Joule heating; Lateral crystalline growth; Rapid heating

Indexed keywords

CHROMIUM; CRYSTAL GROWTH; CRYSTALLIZATION; FABRICATION; HEAT TREATMENT; PHONONS; RAMAN SCATTERING; SILICON; THERMAL EFFECTS;

ELECTRIC CURRENT FLOW; JOULE HEATING; LATERAL CRYSTAL GROWTH; RAPID HEATING;

THIN FILMS;

EID: 22944488586     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.01.084     Document Type: Conference Paper

References (16)

1. T. Sameshima, S. Usui, and M. Sekiya IEEE Electron Device Lett. 7 1986 276
2. K. Sera, F. Okumura, H. Uchida, S. Itoh, S. Kaneko, and K. Hotta IEEE Trans. Electron Devices 36 1989 2868
3. T. Serikawa, S. Shirai, A. Okamoto, and S. Suyama Jpn. J. Appl. Phys. 28 1989 L1871
4. A. Kohno, T. Sameshima, N. Sano, M. Sekiya, and M. Hara IEEE Trans. Electron Devices 42 1995 251
5. A. Matsuda J. Non-Cryst. Solids 59-60 1983 767
6. Y. Chida, M. Kondo, and A. Matsuda J. Non-Cryst. Solids 198-200 1996 1121
7. K. Nakahata, A. Miida, T. Kamiya, Y. Maeda, C.M. Fortmann, and I. Shimizu Jpn. J. Appl. Phys. 31 1998 L1026
8. H. Matsumura Jpn. J. Appl. Phys. 37 1998 3175
9. K.H. Lee, J.K. Park, and J. Jang IEEE Trans. Electron Devices 45 1998 2548
10. H. Kuriyama, Hiroyuki Kuriyama, Takahashi Kuwahara, Satoshi Ishida, Tomoyuki Nohda, Keiichi Sano, Hiroshi Iwata, Shigeru Noguchi, Seiichi Kiyama, Shinya Tsuda, Shoichi Nakano, Mosato Isumi, and Yukinori Kuwano Jpn. J. Appl. Phys. 31 1992 4550
11. N. Andoh, and T. Sameshima: printed in Jpn. J. Appl. Phys.
12. N. Andoh, H. Takahashi, and T. Sameshima Mater. Res. Soc. Symp. Proc. 664 2001 A6.2
13. T. Sameshima, Y. Kaneko, and N. Andoh Appl. Phys., A 73 2001 419
14. T. Sameshima, Y. Kaneko, and N. Andoh Appl. Phys., A 74 2002 719
15. X.L. Wu, G.G. Siu, S. Tong, X.N. Liu, F. Yan, S.S. Jiang, X.K. Zhang, and D. Feng Appl. Phys. Lett. 69 1996 423
16. R.F. Wood, and G.E. Giles Phys. Rev., B 23 1981 2923