New technology of metal oxide thin film preparation for chemical sensor application

Sensors and Actuators, B: Chemical

Volumn 109, Issue 1, 2005, Pages 128-134

  Khatko, Viacheslav ^a   Calderer, Josep ^b   Llobet, Eduard ^a   Correig, Xavier ^a  

^a UNIVERSITAT ROVIRA I VIRGILI   (Spain)

^b UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

Author keywords

Deposition with interruptions; Rf sputtering; WO 3 based sensors; WO3 thin films

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; OXIDES; POWDERS; SPUTTER DEPOSITION; TUNGSTEN COMPOUNDS; ULTRATHIN FILMS;

DEPOSITION WITH INTERRUPTIONS; RF SPUTTERING; WO3 THIN FILMS; WO3-BASED SENSORS;

CHEMICAL SENSORS;

EID: 22944458548     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2005.03.073     Document Type: Article

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