Rapid thermal processing for silicon nanoelectronics applications

JOM

Volumn 57, Issue 6, 2005, Pages 21-26

  Fiory, A T ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; GATES (TRANSISTOR); HEAT TRANSFER; INTEGRATED CIRCUIT MANUFACTURE; MOSFET DEVICES; NANOTECHNOLOGY; RAPID THERMAL ANNEALING; SEMICONDUCTOR JUNCTIONS; SILICON WAFERS;

RAPID THERMAL PROCESSING; SILICON NANOELECTRONICS;

SEMICONDUCTING SILICON;

EID: 22944437404     PISSN: 10474838     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11837-005-0131-0     Document Type: Review

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