Recent advances in secondary ion mass spectrometry to characterize ultralow energy ion implants

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 5, 1999, Pages 2345-2351

  Chia, Victor K F ^a  

^a CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22844455997     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590916     Document Type: Article

References (4)

1. V. K. F. Chia, Materials and Process Characterization of Ion Implantation, edited by M. I. Current and C. B. Yarling (Ion Beam Press, 1997), p. 163.
2. W. Class and J. J. Wortman, Characterization and Metrology for ULSI Technology, edited by D. G. Seiler, A. S. Diebold, W. M. Bullis, T. J. Shaffner, R. McDonald, and E. J. Walters (1998), p. 57.
3. P. D. Augustus et al., Secondary Ion Mass Spectrometry, SIMS VI (1988), p. 488.
4. M. G. Dowsett, G. A. Cooke, D. I. Elliner, T. J. Ormsby, and A. Murrell, Secondary Ion Mass Spectrometry SIMS XI, edited by G. Gillen, R. Lareau, J. Bennett, and F. Stevie (1997), p. 285.