Metal silicides synthesized by high current metal-ion implantation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 5, 1999, Pages 2277-2283

  Liu, B X ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22844454601     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591077     Document Type: Article

References (2)

1. S. P. Murarka, Suicides for VLSI Application (Academic, New York, 1983).
2. J. C. Hensel, R. T. Tung, J. M. Poate, and F. C. Unterwald, Appl. Phys. Lett. 44, 913 (1984).