(Ti, Al)N films deposited by double-target reactive magnetron co-sputtering

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

Volumn 25, Issue 3, 2005, Pages 233-237

  Yan, Liangchen ^a   Xiong, Xiaotao ^a   Yang, Huisheng ^a   Gao, Kewei ^a   Wang, Yanbin ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

(Ti, Al)N; Magnetron co sputtering; Metal sputtering; Nonmetal sputtering; Plasma emission spectra

Indexed keywords

ALUMINUM NITRIDE; MAGNETRON SPUTTERING; MICROHARDNESS; MICROSTRUCTURE; NITROGEN; TITANIUM NITRIDE; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS;

(TI, AL)N FILMS; DOUBLE-TARGET REACTIVE MAGNETRON CO-SPUTTERING; METALLIC SPUTTERING MODE; NITROGEN FLOW RATE; NON-METALLIC SPUTTERING MODE; PLASMA PHOTOEMISSION SPECTROSCOPY; WEAR RESISTANT COATINGS;

PROTECTIVE COATINGS;

EID: 22844433905     PISSN: 16727126     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. Shew Bor-yuan, Huang Jow-Lay. The effects of nitrogen flow on reactively sputtering Ti-Al-N films. Surface and Technology, 1995, 71: 30-36
2. Shew Bor-yuan, Huang Jow-Lay, Lii Ding-Fwu. Efiects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiAlN films. Thin Solid Films, 1997, 293: 212-219
3. Chakrabarti K, Jeong J J, Hwang S K et al. Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique. Thin Solid Films, 2002, 406: 159-163
4. Zeng X T, Zhang Sam, Tam L S. Multilayered (Ti, Al) ceramic coating for high-speed machining applications. American Vacuum Society, 2001: 1919-1922
5. Setsuhara Y, Suzuki T, Makino Y et al. Phase variation and properties of (Ti, Al) N films prepared by ion beam assisted deposition. Surface and Coatings Technology, 1997, 97: 254-258