Study of factors limiting electron mobility in InSb quantum wells

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 3, 1999, Pages 1151-1154

  Chung, S J ^a  

^a UNIVERSITY OF OKLAHOMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644452037     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590712     Document Type: Article

References (13)

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13. The data shown in Fig. 2 is for wafer pieces with morphologies typical of the majority of the wafer area. The two additional lower-mobility samples in Fig. 5 are pieces from the edge of a wafer. For some wafers, the morphology at the edges is noticeably worse than at the center.