Material Dependence of Sputtering Behavior During Focused Ion Beam Milling: A Correlation Between Monte Carlo Based Simulation and Empirical Observation

Microscopy and Microanalysis

Volumn 4, Issue , 1998, Pages 858-859

  Prenitzer, B I ^a   Giannuzzi, L A ^a   Brown, S R ^b   Irwin, R B ^b   Shofner, T L ^c   Stevie, F A ^b  

^a University of Central Florida   (United States)

^b Cirent Semiconductor   (United States)

^c Kirk Resources   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22444452587     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927600024417     Document Type: Conference Paper

References (8)

1. L.A. Giannuzzi et al., : MRS. Symp. Proc. Workshop on Specimen Preparation for TEM of Materials IV (1997)19.
2. L.A. Giannuzzi et al., Micros. Res. Tech. (1997) in press.
3. B.I. Prenitzer et al., Met. and Mat. Trans. (1998) in press.
4. F.A. Stevie et al., Surf. Interface Anal. 23 (1995)61.
5. J.F. Ziegler et al., The Stopping Range of Ions in Solids, New York Pergamon Press (1985).
6. H. Yamaguchi et al., J. Vac. Sci. Technol. B3(l) (1985)71.
7. T. Ishitani. Jpn. Journal of Applied Phys. (34) (1995)3303.
8. This work was made possible through the generous support of Cirent Semiconductor and a Department of Defense NDSEG fellowship, contract number P-34862-RT-NDF.