From piranha to barracuda: Mechanism of ozone and water vapor photoresist strip in a wet bench

Solid State Phenomena

Volumn 76-77, Issue , 2001, Pages 227-230

  Riedel, T ^a   Wolke, K ^a   De Gendt, S ^b   Onsia, B ^b  

^a STEAG AG   (Germany)

^b IMEC   (Belgium)

Author keywords

Organic removal; Ozone; Stripping; Vapor

Indexed keywords

BARK STRIPPING; OZONE; PHOTORESISTS; REACTION KINETICS; VAPORS;

10 MINUTES; CHEMICAL INTERACTIONS; DUV RESIST; GAS ENVIRONMENT; ORGANIC CONTAMINATION; ORGANIC REMOVAL; PHOTORESIST STRIP; SAFETY CONDITION;

STRIPPING (REMOVAL);

EID: 22244443291     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.76-77.227     Document Type: Conference Paper

References (4)

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3. K. Wolke, T. Riedel, R. Haug, S. De Gendt. ECS 99 Hawai, Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor.
4. K. Sebested, H. Corfitzen, J. Holeman, and Edwin J. Hart: Decomposition of ozone in aqueous Acetic acid solution, 1991