Electron optical phase-shifts by Fourier methods: Analytical versus numerical calculations

Ultramicroscopy

Volumn 104, Issue 3-4, 2005, Pages 193-205

  Fazzini, P F ^a   Pozzi, G ^a   Beleggia, M ^b  

^a UNIVERSITY OF BOLOGNA   (Italy)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

Electromagnetic fields; Electron holography; Electron optical phase shift; Image simulation; Lorentz microscopy

Indexed keywords

BOUNDARY CONDITIONS; ELECTROMAGNETIC FIELD EFFECTS; FOURIER OPTICS; IMAGE ANALYSIS; NUMERICAL ANALYSIS; SEMICONDUCTOR JUNCTIONS;

FOURIER METHODS; LONG-RANGE FRINGING FIELDS; PHASE CONTRAST IMAGES; REVERSE-BIASED P-N JUNCTIONS;

PHASE SHIFT;

ANALYTIC METHOD; ARTICLE; ELECTROMAGNETIC FIELD; FOURIER ANALYSIS; HOLOGRAPHY; IMAGE ANALYSIS; IMAGE ENHANCEMENT; IMAGE QUALITY; INFRARED SPECTROSCOPY; INTERMETHOD COMPARISON; MAGNETIC FIELD; PHASE CONTRAST MICROSCOPE; THEORETICAL STUDY;

EID: 22144459858     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2005.04.002     Document Type: Article

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