Preparation and characteristic of p-type ZnO films by Al-N codoping technique

Materials Letters

Volumn 59, Issue 22, 2005, Pages 2732-2734

  Zhang, Zheng Hai ^a   Ye, Zhi Zhen ^a   Ma, De Wei ^a   Zhu, Li Ping ^a   Zhou, Ting ^a   Zhao, Bing Hui ^a   Fei, Zhu Ge ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Al N codoping; DC reactive magnetron sputtering; p Type conduction; ZnO

Indexed keywords

ALUMINUM NITRIDE; CARRIER CONCENTRATION; CRYSTAL GROWTH; CRYSTAL STRUCTURE; DOPING (ADDITIVES); MAGNETRON SPUTTERING; SYNTHESIS (CHEMICAL); TEMPERATURE DISTRIBUTION; ZINC OXIDE;

AL-N CODOPING; CODOPING TECHNIQUES; DC REACTIVE MAGNETRON SPUTTERING; P-TYPE CONDUCTION;

METALLIC FILMS;

EID: 22144437032     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.04.008     Document Type: Article

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