Removal of nickel ions from industrial plating effluents using activated alumina as adsorbent

Journal of Environmental Science and Engineering

Volumn 47, Issue 1, 2005, Pages 1-6

  Revathi, M ^a   Kavitha, B ^a   Vasudevan, T ^a  

^a ALAGAPPA UNIVERSITY   (India)

Author keywords

Activated alumina; Adsorption; Freundlich isotherm; Langmuir isotherm

Indexed keywords

ALUMINUM; NICKEL;

ADSORPTION; ARTICLE; ELECTROPLATING INDUSTRY; INDUSTRIAL WASTE; ISOLATION AND PURIFICATION; METHODOLOGY; PH; TEMPERATURE; WATER MANAGEMENT;

ADSORPTION; ALUMINUM; ELECTROPLATING; HYDROGEN-ION CONCENTRATION; INDUSTRIAL WASTE; NICKEL; TEMPERATURE; WATER PURIFICATION;

EID: 22144431877     PISSN: 0367827X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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