Materials and devices for ultrafast all-optical processing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5724, Issue , 2005, Pages 1-12

  Nagamura, Toshihiko ^a   Naito, Atsushi ^b   Nagai, Yasuyuki ^b   Matsumoto, Ryuji ^a   Yokoyama, Yasushi ^c   Furube, Akihiro ^d   Murata, Shigeo ^d  

^a KYUSHU UNIVERSITY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

^c YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

All optical and very fast control of reflectance; Fulgide; Guided wave mode; Metallophthalocyanines; Photochromism; Photoinduced changes of electronic states; Photoinduced complex refractive index changes; Photoinduced electron transfer; Spiropyran

Indexed keywords

FLUORESCENCE; INFRARED RADIATION; LIGHT POLARIZATION; MAGNETIC RECORDING; OPTICAL DEVICES; OPTICAL MATERIALS; PHOTOCHROMISM; PHOTONS; REFRACTIVE INDEX; SEMICONDUCTOR LASERS; THIN FILMS; ULTRASHORT PULSES;

ALL OPTICAL AND VERY FAST CONTROL OF REFLECTANCE; FULGIDE; GUIDED WAVE MODES; METALLOPHTHALOCYANINES; PHOTOINDUCED CHANGES OF ELECTRONIC STATES; PHOTOINDUCED COMPLEX REFRACTIVE INDEX CHANGES; PHOTOINDUCED ELECTRON TRANSFER; SPIROPYRAN;

ULTRAFAST PHENOMENA;

EID: 21844465679     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601404     Document Type: Conference Paper

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