Molecular dynamics simulation of oxygen in silicon melt

Journal of Crystal Growth

Volumn 198-199, Issue PART I, 1999, Pages 114-119

  Kakimoto, K ^a   Kikuchi, Shin ^a   Ozoe, Hiroyuki ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION IN LIQUIDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR DYNAMICS; MOLECULAR VIBRATIONS; OXYGEN; POINT DEFECTS; POTENTIAL ENERGY; SILICON;

VACANCIES;

CRYSTAL GROWTH FROM MELT;

EID: 21844434250     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)01115-4     Document Type: Article

References (6)

1. W. Zulehner, D. Huber, in: J. Grabmaier (Ed.), Crystal Growth, Properties and Applications, vol. 18, Springer, Berlin, 1988, p. 1.
2. K. Kakimoto, H. Ozoe, J. Electrochem. Soc., in press.
3. Z. Jiang, R.A. Brown, Chem. Eng. Sci. 49 (1994) 2991.
4. Ali Aravi, L.J. Alvarez, S.R. Elliott, I.R. McDonald, Phil. Mag. B 65 (1992) 489.
5. F. Stillinger, T. Weber, Phys. Rev. B 31 (1985) 5262.
6. R.J. Bell, Vibrational properties of amorphous solids, in: B. Alder, S. Fernbach, M. Rotenberg (Eds.), Methods in Computational Physics, Academic Press, New York, p. 215.