Polarization separation element (sub-wavelength structure)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5720, Issue , 2005, Pages 269-279

  Kitagawa, Seiichiro ^a   Yamamoto, Kazuya ^a   Okada, Makoto ^a  

^a Nalux Co Ltd   (Japan)

Author keywords

Dry etching; Electron beam exposure; Injection molding; Polarization separation element; Sub wavelength structure; Vacuum evaporation

Indexed keywords

ANISOTROPY; BIREFRINGENCE; DRY ETCHING; ELECTRON BEAMS; EVAPORATION; INJECTION MOLDING; PLASTIC PRODUCTS; REFRACTIVE INDEX; SURFACE PHENOMENA; VACUUM APPLICATIONS;

ELETRON-BEAM EXPOSURE; POLARIZATION SEPARATION ELEMENT; SUB-WAVELENGTH STRUCTURE; VACUUM EVAPORATION;

LIGHT POLARIZATION;

EID: 21844432405     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.608418     Document Type: Conference Paper

References (1)

1. KIKUTA H. et al., Current Topics in Diffractive Optics Vol.J183-C No3 pp 173-181 March, 2000