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Applied Physics A: Materials Science and Processing

Volumn 81, Issue 3, 2005, Pages 487-493

Tip-induced nano-writing/machining of Si and DLC surfaces - "Anodic" versus thermal oxidation?

(2) Myhra, S a,b Watson, G S a

a GRIFFITH UNIVERSITY (Australia)

b UNIVERSITY OF OXFORD (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CATHODES; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; DIAMOND LIKE CARBON FILMS; DURABILITY; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; IONIZATION; MACHINING; OXIDATION; SILICON;

NANO-WRITING; OXIDANTS; THERMAL DEPOSITION; THERMAL OXIDATION;

NANOTECHNOLOGY;

EID: 21644490098 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-005-3253-x Document Type: Article

Times cited : (14)

References (21)

1
- 0342908968
- J.A. Dagata, J. Schneir, H.H. Harary, C.J. Evans, M.T. Postek, J. Bennett: Appl. Phys. Letts. 56, 2001 (1990)
- (1990) Appl. Phys. Letts. , vol.56 , pp. 2001
- Dagata, J.A.¹ Schneir, J.² Harary, H.H.³ Evans, C.J.⁴ Postek, M.T.⁵ Bennett, J.⁶

2
- 0000688824
- P. Avouris, T. Hertel, R. Martel: Appl. Phys. Letts. 71, 285 (1997)
- (1997) Appl. Phys. Letts. , vol.71 , pp. 285
- Avouris, P.¹ Hertel, T.² Martel, R.³

3
- 0037225220
- S. Myhra: Appl. Phys. A 76, 63 (2003)
- (2003) Appl. Phys. A , vol.76 , pp. 63
- Myhra, S.¹

4
- 0033272913
- R.J.M. Vullers, M. Ahlskog, C. van Hacsendonck: J. Vac. Sci. Tcchnol. B 17, 2417 (1999)
- (1999) J. Vac. Sci. Tcchnol. B , vol.17 , pp. 2417
- Vullers, R.J.M.¹ Ahlskog, M.² Van Hacsendonck, C.³

5
- 0036328578
- H. Shin, S. Hong, J. Moon, J.U. Jeon: Ultramicroscopy 91, 103 (2002)
- (2002) Ultramicroscopy , vol.91 , pp. 103
- Shin, H.¹ Hong, S.² Moon, J.³ Jeon, J.U.⁴

6
- 0346561573
- T. Mühl, H. Brückl, O. Weise, O. Reiss: J. Appl. Phys. 82, 5255 (1997)
- (1997) J. Appl. Phys. , vol.82 , pp. 5255
- Mühl, T.¹ Brückl, H.² Weise, O.³ Reiss, O.⁴

7
- 0000029702
- T. Mühl, H. Brückl, D. Kraut, J. Kretz, I. Mönch, O. Reiss: J. Vac. Sci. Technol. B 16, 3879 (1998)
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3879
- Mühl, T.¹ Brückl, H.² Kraut, D.³ Kretz, J.⁴ Mönch, I.⁵ Reiss, O.⁶

8
- 0242426295
- T. Mühl, J. Kretz, I. Möneh, C.M. Schneider: Appl. Phys. Lett. 76, 786 (2000)
- (2000) Appl. Phys. Lett. , vol.76 , pp. 786
- Mühl, T.¹ Kretz, J.² Möneh, I.³ Schneider, C.M.⁴

9
- 21044438926
- S. Myhra: Appl. Phys. A 80, 1097 (2005)
- (2005) Appl. Phys. A , vol.80 , pp. 1097
- Myhra, S.¹

10
- 2942624045
- S. Myhra: Thin Solid Films 459, 90 (2004)
- (2004) Thin Solid Films , vol.459 , pp. 90
- Myhra, S.¹

11
- 0032141547
- A. Crossley, C. Johnston, G.S. Watson, S. Myhra: J. Phys. D: Appl. Phys. 31, 1955 (1998)
- (1998) J. Phys. D: Appl. Phys. , vol.31 , pp. 1955
- Crossley, A.¹ Johnston, C.² Watson, G.S.³ Myhra, S.⁴

12
- 0000697110
- B. Brar, G.D. Wilk, A.C. Seahaugh: Appl. Phys. Lett. 69, 2728 (1996)
- (1996) Appl. Phys. Lett. , vol.69 , pp. 2728
- Brar, B.¹ Wilk, G.D.² Seahaugh, A.C.³

13
- 0036656795
- H. Seo, M. Tachiki, T. Banno, Y. Sumikawa, H. Umezawa, H. Kawarada: Jpn. J. Appl. Phys. 41, 4980 (2002)
- (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 4980
- Seo, H.¹ Tachiki, M.² Banno, T.³ Sumikawa, Y.⁴ Umezawa, H.⁵ Kawarada, H.⁶

14
- 0031139773
- T. Yasue, H. Koyama, T. Kato: J. Vac. Sci. Technol. B 15, 614 (1997)
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 614
- Yasue, T.¹ Koyama, H.² Kato, T.³

15
- 0029276348
- C.J. Sofield, A.M. Stoneham: Semicond. Sci. Technol. 10, 215 (1999)
- (1999) Semicond. Sci. Technol. , vol.10 , pp. 215
- Sofield, C.J.¹ Stoneham, A.M.²

16
- 0031624563
- R. Lake, O. Klimeck, R. Bowen, D. Jovanovic, P. Sotirelis, W.R. Frensley: VLSI Design 6, 9 (1998)
- (1998) VLSI Design , vol.6 , pp. 9
- Lake, R.¹ Klimeck, O.² Bowen, R.³ Jovanovic, D.⁴ Sotirelis, P.⁵ Frensley, W.R.⁶

17
- 0001678951
- G. Klimeck, R. Lake, R.C. Bowen, W.R. Frensky, T. Moise: Appl. Phys. Lett. 67, 2539 (1995)
- (1995) Appl. Phys. Lett. , vol.67 , pp. 2539
- Klimeck, G.¹ Lake, R.² Bowen, R.C.³ Frensky, W.R.⁴ Moise, T.⁵

18
- 4243962761
- IEEE
- C. Bowen, C. Fernando, O. Klimeck, A. Chaterjee, D. Blanks, R. Lake, J. Hu, J. Davis, M. Kulkarni, S. Hattangady, I-C. Chen: Proceedings of the IEDM, p. 869: IEEE (1997)
- (1997) Proceedings of the IEDM , pp. 869
- Bowen, C.¹ Fernando, C.² Klimeck, O.³ Chaterjee, A.⁴ Blanks, D.⁵ Lake, R.⁶ Hu, J.⁷ Davis, J.⁸ Kulkarni, M.⁹ Hattangady, S.¹⁰ Chen, I.-C.¹¹

19
- 0001088886
- T. Yasue, Y. Yoshida, H. Koyama, T. Kato: J. Vac. Sci. Technol. B 15, 1884 (1997)
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 1884
- Yasue, T.¹ Yoshida, Y.² Koyama, H.³ Kato, T.⁴

20
- 0029369746
- S. J. O'Shea, R.M. Atta, M.P. Murrell, M.L. Welland: J. Vac. Sci. Technol. B 13, 1945 (1995)
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 1945
- O'Shea, S.J.¹ Atta, R.M.² Murrell, M.P.³ Welland, M.L.⁴

21
- 0037406953
- J.E. Park, J. Shields, D.K. Schroder: Solid-State Electronics 47, 855 (2003)
- (2003) Solid-State Electronics , vol.47 , pp. 855
- Park, J.E.¹ Shields, J.² Schroder, D.K.³

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