Fabrication of SAW devices using SEM-based electron beam lithography and lift-off technique for lab use

Proceedings - IEEE Ultrasonics Symposium

Volumn 3, Issue , 2004, Pages 1896-1900

  Hatakeyama, Hisashi ^a   Omori, Tatsuya ^a   Hashimoto, Ken Ya ^a   Yamaguchi, Masatsune ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI-STATIC LAYERS; CONDUCTING LAYERS; LIFT-OFF TECHNIQUE; LINE-WIDTH;

ELECTRODES; ELECTRON BEAMS; LITHOGRAPHY; RESONATORS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TRANSDUCERS;

ACOUSTIC SURFACE WAVE DEVICES;

EID: 21644468091     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULTSYM.2004.1418201     Document Type: Conference Paper

References (8)

1. H.I. Smith, Surface Wave Device Fabriation, in Surface Acoustic Wave Filters, H. Matthews ed., John Wiley & Sons (1977) pp. 165-217.
2. K. Yamanouchi, Z. H. Chen and T. Meguro, GHz-RangeE StepP-TypeE Unidirectional Low-Loss Filters And 5GHz-Range Conventional I.D.T. Filters, IEEE Ultrasonics Symposium Proceedings, (1986) pp.81-84
3. K. Yamanouchi, Y. Cho and T. Meguro, SHF-Range Surface Acoustic Wave Inter-Digital Transducers Using Electron Beam Exposure, IEEE Ultrasonics Symposium Proceedings, (1988) pp. 115-118.
4. K. Yamanouchi, GHz-Range SAW Device Using Nano-Meter Electrode Fabrication Technology, Proc. IEEE Ultrason. Symp. (1994) pp.1421-428.
5. K. Yamanouchi, Current SAW Research Activities in Japan, Proc. Second International Symp. on Acoustic Wave Devices for Future Mobile Communication Systems (2004) pp. 1-8.
6. C. S. Hartmann and B. P. Abbott, Overview of Design Challenges for Single Phase Unidirectional SAW Filters, Proc. IEEE Ultrason. Symp. (1989) pp. 79-89.
7. T. Omori, K. Hashimoto and M. Yamaguchi, Application of Cu Electrodes to SAW IF Devices, Proc. Second International Symp. on Acoustic Wave Devices for Future Mobile Communication Systems (2004) pp.177-181.
8. A.K. Nallani, S.W. Park and J.B. Lee, Characterization of SU-8 as a resist for electron beam lithography, SPIE: Microtechnologies for New Millennium (2003) pp. 414-423.