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Volumn 83, Issue 26, 2005, Pages 26-30
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Forging the way to high-K dielectrics
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
CHEMICAL VAPOR DEPOSITION;
ELECTRONS;
GATES (TRANSISTOR);
HAFNIUM;
HAFNIUM COMPOUNDS;
SEMICONDUCTOR MATERIALS;
AIR PRODUCTS (CO);
INTEL (CO);
PRAXAIR (CO);
SEMICONDUCTOR INDUSTRY;
DIELECTRIC MATERIALS;
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EID: 21644467536
PISSN: 00092347
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
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Times cited : (4)
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References (0)
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